| 摘要 |
PURPOSE:To obtain a resist of high resolution and high sensitivity by mixing a polymer A which causes thermal crosslinking in a specific temp. range, and a polymer B which has good compatibility with the polymer A while having no reactivity at said temp. within a specific weight ratio range. CONSTITUTION:The polymer A of which the number average mol.wt. (MN) through polystyrene conversion by a gel permeation chromatography method is between 10,000-1,000,000 and which crosslinks at 100-250 deg.C is obtained as a copolymer with methacrylate, for example, glycidyl methacrylate. On the other hand, the composition prepd. by dissolving the polymer B or copolymer of polymethacrylate etc. which has no reactivity at the above-mentioned temp., has good compatibility with the polymer A and of which the MN by said method is 10,000- 1,000,000 and the polymer A in a good solvent at the ratios expressed by the formula is used as the positive type resist. This yields the composition having excellent adhesiveness to substrates, etching resistance, heat resistance, etc. |
