Washer for photopolymer layer - has brush mat held against process roller with tensioning frame

摘要

The washer for an exposed photopolymer layer has the layer plates fitted to a rotating drum (1) with the lower part of the drum in a bath of developer. A brush mat (10) is stretched between two support bars (5,6) and held against the drum while a smaller brush (11) scrubs the top surface of the drum with a reciprocating axial movement. The mat supports can be adjusted for spacing to fit different sizes of drum, with the mat loop also adjustable. The vertical setting of the drum axis is likewise adjustable.