发明名称 |
Process for the deposition of thick chromium films from trivalent chromium plating solutions and article so produced |
摘要 |
A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.
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申请公布号 |
US4293620(A) |
申请公布日期 |
1981.10.06 |
申请号 |
US19800157714 |
申请日期 |
1980.06.09 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
VIGAR, JAMES M. L. |
分类号 |
C25D3/06;(IPC1-7):C25D3/06;C25D5/12;C25D5/14 |
主分类号 |
C25D3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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