| 摘要 |
PURPOSE:To produce a film of a highly magnetic material rapidly by a method wherein a magnetic field is generated at the surface of a target and a plasma can be focused even when a ferromagnetic body is used as the target. CONSTITUTION:In the magnetron sputtering electrode provided with the target of the ferromagnetic body and an electromagnet placed below the target, the thickness W11 of a central magnetic core and the thickness W21 of a lateral magnetic core are so designed as to satisfy the formulas, where (t) is the thickness of the target, BTS is the saturation flux density of the target and BMS is the saturation flux density of a yoke. Accordingly, a leakage magnetic field is generated at the target surface and the plasma can be focused, the film of ferromagnetic material is produced. This applies also to a magnetron sputtering electrode provided with a permanent magnet in place of the electromagnet. |
