| 摘要 |
An ultraviolet light sensitive polymer composition wherein resistance to photodegradation is enhanced by the inclusion therein of a stabilizer polymer having structural units corresponding to the following formula <IMAGE> wherein Ra, Rb, and Rc are independently selected from alkyl groups containing 1 to about 12 carbon atoms, a cyclohexyl group, or cyclohexylalkyl groups containing 7 to about 14 carbon atoms; A is selected from the group consisting of alkyl groups containing 1 to about 24 carbon atoms, hydroxyalkyl groups containing 1 to about 18 carbon atoms, alkoxy groups containing 1 to about 12 carbon atoms in the group, ester groups containing a total of from 2 to about 24 carbon atoms in the group, a cyclohexyl group, cyclohexylalkyl groups containing 7 to about 14 carbon atoms in the group, hydroxy groups, amino groups and aminoalkyl groups and alkyl-substituted amino and aminoalkyl groups wherein the alkyl contains 1 to about 12 carbon atoms; Z is a segment of the polymer backbone derived from an olefinic monomer; x is 0, 1, 2 or 3 and B is hydrogen, an alkyl group containing 1 to about 12 carbon atoms, a cyclohexyl group, or a cyclohexylalkyl group of 7 to about 14 carbon atoms in the group; and m is at least 2. The above stabilizer polymer can be simply combined with, or engrafted upon, the ultraviolet light sensitive polymer. The stabilizer polymer may also be copolymerized with, or grafted upon other polymeric materials thereby enhancing its phase compatability with the ultraviolet light sensitive polymer. In certain instances, it is also possible to copolymerize the monomers from which are derived the ultraviolet light sensitive polymer and the stabilizer polymer.
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