| 摘要 |
<p>An automatic production apparatus (10) for processing a plurality of semiconductor wafers, which includes a rotor (15) rotatable about a substantially, but not true, horizontal axis, wherein the rotor includes a removable carrier (38) capable of holding a plurality of closely loaded semi-conductor wafers and a support for retaining semiconductor wafers in the carrier when the carrier is inverted. It also includes a plurality of spray nozzles (33, 35) for providing processing fluids and drying gases, and a recessed drain (23) for removing the expended fluids. </p> |
