| 摘要 |
PURPOSE:To provide an etching liquid for the plating pretreatment of a Zr type metal to which a selectivity for generating etched pores, enhanced adhesiveness with a plated film and improved treating capacity of said liquid are imparted by adding a specific org. quaternary ammonium salt to an aqueous hydrogen fluoride solution. CONSTITUTION:In an aqueous hydrogen fluoride solution, an org. quaternary ammonium salt shown by the formula [wherein R' and R'' are H, 1-4C alkyl group, aryl group, benzyl group, CH2COOR''', (n) is 0 or 1-8, (m) is 5-5,000, X is a halogen atom, -SO3R', -OSO3R', R''' is H or an 1-4C alkyl group], for example, polyamine sulfone is contained in an amount of 10-500ppm. Said aqueous hydrogen fluoride solution is generally used at a pH of 2-4 and at a concn of 0.1- 1.0mol/l. If said aqueous solution is used in etching said Zr type metal, etched pores are selectively formed on a surface of said metal and, if used in pretreating prior to plating treatment, the close adhesiveness of the plating film is enhanced. |
