| 发明名称 |
Method of forming a microscopic pattern |
| 摘要 |
A method of forming a microscopic pattern wherein the object to be etched is overlaid with a film made of a material which is highly immune to etching and further provided with a reflection reducing film. Thus, the reflection of the irradiating ultraviolet rays by the underlying layer is effectively prevented.
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| 申请公布号 |
US4288283(A) |
申请公布日期 |
1981.09.08 |
| 申请号 |
US19800110445 |
申请日期 |
1980.01.08 |
| 申请人 |
HITACHI, LTD. |
发明人 |
UMEZAKI, HIROSHI;NISHIDA, HIDEKI;TSUMITA, NORIKAZU;YAMADA, HIROZI;KANEKO, KATSUHIRO;KOISO, NAGATUGU |
| 分类号 |
H01L21/306;G03F7/09;(IPC1-7):C23F1/02 |
主分类号 |
H01L21/306 |
| 代理机构 |
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代理人 |
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