| 摘要 |
PURPOSE:To prevent the damage of a resist film due to the electron beam by irradiating the film at predetermined time interval with the electron beam of small exposure amount plural times. CONSTITUTION:When a region A is divided into small region segments a1, a2,... and exposed, the electron beam of the exposure amount of, for example, 1/2 of necessary exposure amount is first irradiated, the beam of similar amount is then irradiated second, and necessary exposure amount is thus irradiated. Thus, the damage of the resist film caused by the irradiation of the electron beam having high energy can be prevented. |
