发明名称 |
PROCESSING SOLUTION FOR PHOTOSENSITIVE LAMINATE HAVING ALCOHOLLSOLUBLE POLYAMIDE LAYER |
摘要 |
PURPOSE:To enhance the safety of a processing soln. capable of performing development and etching by one-stage processing by adding a neutral salt of an aromatic sulfonic acid or a carboxylic acid to the soln to lower the alkalinity. CONSTITUTION:An alcohol-soluble polyamide layer and a photosensitive resin layer contg. photosoluble o-benzoquinone azide as a photosensitive material are formed in this order to manufacture a photosensitive laminate. A neutral salt such as Na salt of an aromatic sulfonic acid such as toluenesulfonic acid or a carboxylic acid such as salicylic acid is added to an alkaline aqueous alcohol soln. which develops the resin layer and etches the polyamide layer by the one-stage processing of the laminate. Thus, the alkalinity of the processing soln. is lowered to enhance the safety, and a higher developing speed and enhanced resolving power are attained. |
申请公布号 |
JPS56110934(A) |
申请公布日期 |
1981.09.02 |
申请号 |
JP19800013267 |
申请日期 |
1980.02.06 |
申请人 |
DAICEL LTD |
发明人 |
ISHIHARA TETSUO;KUBO KEIJI |
分类号 |
G03F7/40;G03F7/032;G03F7/09;G03F7/30;G03F7/32 |
主分类号 |
G03F7/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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