发明名称 PROCESSING SOLUTION FOR PHOTOSENSITIVE LAMINATE HAVING ALCOHOLLSOLUBLE POLYAMIDE LAYER
摘要 PURPOSE:To enhance the safety of a processing soln. capable of performing development and etching by one-stage processing by adding a neutral salt of an aromatic sulfonic acid or a carboxylic acid to the soln to lower the alkalinity. CONSTITUTION:An alcohol-soluble polyamide layer and a photosensitive resin layer contg. photosoluble o-benzoquinone azide as a photosensitive material are formed in this order to manufacture a photosensitive laminate. A neutral salt such as Na salt of an aromatic sulfonic acid such as toluenesulfonic acid or a carboxylic acid such as salicylic acid is added to an alkaline aqueous alcohol soln. which develops the resin layer and etches the polyamide layer by the one-stage processing of the laminate. Thus, the alkalinity of the processing soln. is lowered to enhance the safety, and a higher developing speed and enhanced resolving power are attained.
申请公布号 JPS56110934(A) 申请公布日期 1981.09.02
申请号 JP19800013267 申请日期 1980.02.06
申请人 DAICEL LTD 发明人 ISHIHARA TETSUO;KUBO KEIJI
分类号 G03F7/40;G03F7/032;G03F7/09;G03F7/30;G03F7/32 主分类号 G03F7/40
代理机构 代理人
主权项
地址