发明名称 Photogrammetric measuring system
摘要 An electro-optical measuring system in a photogrammetric comparator or stereocompiler comprises a visible light transparent phase grating which is carried upon a surface of the photo support plate of the device. The grating is formed as a composite layer of lambda /4 films of at least two dielectric materials of different refractive index which are deposited on the support in such a manner as to yield parallel bands in which the two film materials are in alternating sequence from band to band. As a result of this structure which ensures a constant physical and optical thickness with respect to transmitted imaging light over the whole granting pattern, image-degrading diffraction of the transmitted visible light is avoided, yet the grating pattern provides interfering diffraction in reflection which may be utilized in a precise displacement measuring system.
申请公布号 US4286871(A) 申请公布日期 1981.09.01
申请号 US19800176886 申请日期 1980.08.11
申请人 KEUFFEL & ESSER COMPANY 发明人 ERICKSON, KENT E.
分类号 G01B11/02;G01C11/04;(IPC1-7):G03B27/00;G01B11/14;H01J3/14 主分类号 G01B11/02
代理机构 代理人
主权项
地址