APPARATUS FOR ION PLASMA COATING OF ARTICLES

摘要

APPARATUS FOR ION PLASMA COATING OF ARTICLES The proposed apparatus is used to apply thin films of metals, semiconductors and dielectric materials onto the surface of different articles. The apparatus comprises a vacuum chamber accommodating a discharge chamber with at least a single slit in one of its walls. An electric field produces a plasma flow between an anode and a hot cathode arranged in the discharge chamber so that the hot cathode is located opposite the slit of the discharge chamber. A magnetic system produces a magnetic field extending through the hot cathode and slit perpendicular to the electric field between the anode and hot cathode. A target and an article holder are arranged on opposite sides of the plasma flow leaving the slit. As a negative potential is applied to the target, plasma ions sputter the material of the target, which is deposited on the article, producing a thin film on its surface.