发明名称 PATTERN DEFECT CORRECTING DEVICE
摘要 PURPOSE:To reduce the damage of a substrate by charged beams by heating the substrate in the middle of projecting charged beams or after projection. CONSTITUTION:The substrate 10 is heated in the middle of projecting charged beams or after projection. A heating device 5 is installed beneath a moving stage 4. While the glass substrate 10 is heated, ion beams 8 are projected and scanned. Therefore, color centers, etc., disappear due to heat energy, and an organization is restored. Thus damages of the glass substrate 10, which are caused by ion injection, can be removed. Moreover the edge of an ion projection part is sharpened to obtain high image quality patterns at high accuracy.
申请公布号 JPS643661(A) 申请公布日期 1989.01.09
申请号 JP19870159386 申请日期 1987.06.25
申请人 MITSUBISHI ELECTRIC CORP 发明人 TANAKA KAZUHIRO
分类号 G03F1/00;G03F1/72;G03F1/74;H01L21/027;H01L21/30 主分类号 G03F1/00
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