发明名称 MEASURING METHOD FOR TEMPERATURE OF BASE MATERIAL FOR VAPOR PHASE PLATING
摘要 PURPOSE:To correctly measure the temp. of a base material for plating in a noncontact system through a glass plate and a tube by installing the tube so that it pierces through part of a plating reactor, hermetically seal the outside edge of the tube with the glass plate, and feeding a carrier gas into the reactor. CONSTITUTION:Tube 9 for taking out heat radiation for measurement is installed in vapor phase plating apparatus 1 so that it pierces through sealant 3 and extends near to base material A for plating in plating reaction chamber 4, and outside edge 10 of tube 9 is hermetically sealed with optical glass 11. A carrier gas is introduced from inlet pipe 13 close to edge 10 and fed into chamber 4 from inside edge opening 12 of tube 9 to inhibit plating vapor from flowing in tube 9. Thus, in vapor phase plating the temp. of base material A can be measured correctly with heat radiation which reaches body 14 of the temp. measuring unit through tube 9.
申请公布号 JPS56108872(A) 申请公布日期 1981.08.28
申请号 JP19790163202 申请日期 1979.12.15
申请人 KOGYO GIJUTSUIN 发明人 OKAMOTO SHIGETAKA;SHIKADA YORIO
分类号 C23C14/54;C23C16/52 主分类号 C23C14/54
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