发明名称 Semiconductor device having a protective layer, and method for producing it.
摘要 A semiconductor device having a protective polyimide film layer for preventing alpha -rays from intruding into the device is provided. The polyimide film layer has incorporated therein a salient amount of finely divided filler particles, and is formed on the surface of at least a region wherein the semiconductor element is formed. The polyimide film layer is formed by coating the semiconductor substrate with a liquid polyimide or polyamic acid composition having incorporated therein the finely divided filler particles, according to a screen printing method.
申请公布号 EP0034455(A2) 申请公布日期 1981.08.26
申请号 EP19810300530 申请日期 1981.02.10
申请人 FUJITSU LIMITED 发明人 ABIRU, AKIRA;SUGIMOTO, MASAHIRO;INOMATA, JURO
分类号 H01L21/312;H01L23/29;H01L23/31;H01L23/556 主分类号 H01L21/312
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