发明名称 |
Family of compounds crosslinkable by photon irradiation |
摘要 |
A family of negative resins, capable of undergoing crosslinking under the effect of more or less energetic photons (gamma radiation, X-rays, ultraviolet or visible light), applicable to the protection of objects against atmospheric agents and to the production of masks of the type used in the production of integrated circuits. The typical compound according to the invention contains at least one substance of which the chemical formula comprises a thiirane ring: <IMAGE> such as 2,3-epithiopropyl methacrylate copolymerized with a vinyl monomer, such as methyl methacrylate. Crosslinking is facilitated by photoinitiators, such as aryl diazonium and aryl iodonium salts liberating Lewis acids. By selecting the photoinitiator, it is possible to act on the spectral region where irradiation is effective.
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申请公布号 |
US4285788(A) |
申请公布日期 |
1981.08.25 |
申请号 |
US19790067905 |
申请日期 |
1979.08.20 |
申请人 |
THOMSON-CSF |
发明人 |
ERANIAN, ARMAND;DUBOIS, JEAN-CLAUDE;GAZARD, MARYSE;BARRE, FRANCOISE |
分类号 |
C08L33/02;C08F2/50;C08F20/00;C08F20/38;C08F220/38;C08J3/28;C08K5/23;C08L33/00;C08L33/04;G03F7/021;G03F7/027;G03F7/029;G03F7/038;H01L21/027;H01L21/302;H01L21/3065;(IPC1-7):C08F8/00;C08F8/34;C08J3/24 |
主分类号 |
C08L33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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