| 摘要 |
PURPOSE:To contact a photomask with the face, to be coated with a resists of the substrate to be treated without leaving any bubbles and to smooth separation of the photomask from the resist face after exposure, by irradiating the border of the glass substrate of a photomask for contact exposure with laser beams to form protuberances. CONSTITUTION:Glass substrate 2 is irradiated with YAG laser beams on >=3 point of the border before or after formation of pattern 3 to form about 3mum high protuberances 4 by melting the glass. Photomask 1 thus obtained is allowed to contact with the photoresist coated face of substrate 5 to be treated with pressing jigs 6, and at that time, as the atmosphere of mask 1 and substrate 5 is evacuated to vacuum, mask 1 begins to contact with substrate 5 from the center toward the border, permitting bubbles not to be left, therefore any gaps not to be caused, fluctuation of pattern size and deterioration of resolution to be prevented. Further, separation of the mask after completion of irradiation can be made easily. |
