发明名称 Vapor deposition of heavily doped semiconductor material
摘要 903,509. Semi-conductor devices. INTERNATIONAL BUSINESS MACHINES CORPORATION. Dec. 22, 1960 [Dec.31, 1959], No. 44025/60. Class 37. [Also in Group II] " Esaisi-" or " tunnel diodes " containing sharp PN junctions between heavily doped regions of P and N semi-conductivity and which exhibit quantum mechanical tunneling, are made by vapour deposition (see Group II). The manufacture of parts containing germanium doped with arsenic indium phosphorus or tin is mentioned. Two "Esalsi diodes" poled in opposite directions may also be made by this process (Fig. 3).
申请公布号 US3065116(A) 申请公布日期 1962.11.20
申请号 US19590863316 申请日期 1959.12.31
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 MARINACE JOHN C.
分类号 C30B25/02;H01L21/205;H01L29/00 主分类号 C30B25/02
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