发明名称 Integrated circuit with zener diode and transistor - has buried layers and diode region formed simultaneously with transistor collector
摘要 <p>The integrated circuit has the semiconductor substrate of one type provided with two highly doped buried layers (2,3) of a second type via diffusion, one being used for a Zener diode and the other for a transistor. The substrate is provided with an epitaxial layer (4) of the same type as the buried layers (2,3) with separation zones (5) of opposite type extending through it as the surface of the substrate (1). Two zones (6,7) of the same type as the buried layers (2,3) are formed simultaneously to provide one diode region and the transistor collector respectively. Further zones comprising the second diode zone (8) and the transistor base zone (10) are then formed simultaneously before provision of the emitter zone (11) simultaneous with the formation of a diode connection zone (9). The Zener diode incorporated in the integrated circuit allows Zener voltages between 6.5 and 10 volts to be used.</p>
申请公布号 DE3004680(A1) 申请公布日期 1981.08.13
申请号 DE19803004680 申请日期 1980.02.08
申请人 LICENTIA PATENT-VERWALTUNGS-GMBH 发明人 KAISER,REINHOLD
分类号 H01L21/74;H01L21/761;H01L29/866;(IPC1-7):01L21/72;01L29/90 主分类号 H01L21/74
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