| 摘要 |
PURPOSE:To prevent the lowering of contact strength by a method wherein the ground metal in a window part is pushed out partially, a positive resist is left under the metal and the ground metal is removed with the projected electrode and the positive resist being used as masks. CONSTITUTION:On a Cr film 4 covering the opening an Au projected electrode 2 is formed through the intermediary of a thin Au film 1. When the positive resist is applied and subjected to exposure and development, the resist 8 is kept under the pushed-out part of the electrode 2. Then, the Cr 4 is removed through etching with the electrode 2 and the resist 8 used as the mask. By this constitution, no lowering of contact strength, which is caused by lateral-side etching of the Cr film, takes place. In addition, the stages of process is not increased since the projected electrode itself is employed as the photomask. |
