发明名称 |
Surface treatment device |
摘要 |
A surface treatment device capable of carrying out the surface treatment such as washing or etching of plate-like articles such as semiconductor wafers maintaining high degree of reliability, wherein a surface treating liquid is introduced into a ring-like or a conduit-like treating vessel. The plate-like articles to be treated are moved by a conveyor on a conveyor path having a surface in parallel with the surfaces of the plate-like articles against the stream of the treating liquid in a piece-by-piece manner, so that the surfaces of the plate-like articles are treated, whereby the surfaces of the semiconductor wafers can be desirably treated prior to manufacturing the semiconductor products.
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申请公布号 |
US4282825(A) |
申请公布日期 |
1981.08.11 |
申请号 |
US19790061049 |
申请日期 |
1979.07.26 |
申请人 |
HITACHI, LTD. |
发明人 |
NAGATOMO, HIROTO;TAKAGAKI, TETSUYA;SEKI, HISAO;TERASAKI, SHIROU;HORIMUKI, HITOSHI |
分类号 |
G03F7/30;(IPC1-7):B05C3/04;B05C3/10 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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