| 摘要 |
PURPOSE:To intend the automation of the step by setting a temperature detecting part of the developer in the conventional resist development device and vomiting the developer taking refuge a shutter only within a range of a set temperature. CONSTITUTION:When the temperature of a developer 1 detected by the temperature detecting part 11 is within a range of a setting temperature, a signal is given and a shutter 12 is allowed to take refuge from a position between a nozzle 5 and a wafer 10 with the aid of a motor 12a. When the solution temperature of the amount of the vomit Vo from the nozzle is lower than that of the setting temperature, the shutter does not take refuge and receives the solution. When the solution temperature reaches to the given temperature, the shutter takes refuge automatically and the solution is jetted to the wafer. By this method, since the developer temperature acts to the wafer is defined to the given range, this method is very effective to a positive type resist having a narrow range of a proper temperature particularly. Further, since the maintenance of the delopment conditions is easy, its automation is also possible. |
