发明名称 METHOD OF RECOGNITION OF SEMICONDUCTOR PELLET
摘要 <p>PURPOSE:To intend to shorten the recognition time of a pellet of a whole wafer by abridging the pellet detection which can be judged to be defect from the disorder of the external shape. CONSTITUTION:A pellet 2 which is projected to a TV monitor 4 which partitions to 4 corners S1-S4 and the intermediated portion S5 by parallel lines vertically crossed with parallel lines, and performs a scanning detection by binary signals independently and respectively. When the output signals at four corners are compared with the standard value, the defects at corners can be detected and the position of the pellet on the wafer can be also detected from the judgement of the external shape. In case of the defect of the external shape, an XY stand is carried at high velocity and a pellet having a good external shape is carried on by jumping the pellet having the external defect (2a-2e). On the other hand, the detection of a failure mark is performed approximately at the same time. Accordingly, since the detection can be dispensed with only the scanning in the intermediate potion S2, the necessary detection time is shortened. Thus, the necessary time for detection of the whole wafer can be shortened.</p>
申请公布号 JPS5698835(A) 申请公布日期 1981.08.08
申请号 JP19800001322 申请日期 1980.01.11
申请人 HITACHI LTD 发明人 IKUMI MASUZOU
分类号 H01L21/52;H01L21/66;H01L23/544 主分类号 H01L21/52
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