发明名称 FET Containing stacked gates
摘要 A field effect transistor (FET) comprising a floating gate and a control gate in a stacked relationship with each other and being self-aligned with each other and self-aligned with respect to source and drain regions. The fabrication technique employed comprises delineating both the floating gate and control gate in the same lithographic masking step.
申请公布号 US4282540(A) 申请公布日期 1981.08.04
申请号 US19790086608 申请日期 1979.10.19
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 NING, TAK H.;OSBURN, CARLTON M.;YU, HWA N.
分类号 H01L21/033;H01L21/28;H01L29/49;H01L29/788;(IPC1-7):H01L29/78 主分类号 H01L21/033
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