发明名称 ELECTRONIC BEAM EXPOSURE DEVICE
摘要 PURPOSE:To improve an exposure accuracy by a method wherein a means which irradiates light onto a sample surface, a means which irradiates light onto a sample surface, a means which detects a reflection light from the sample surface and a means which controls so that an image forming position of an electronic beam may coincide with the sample surface based on a reflection photo quantity, are installed in an electronic beam exposure device. CONSTITUTION:A fiber bundle 9 for light projection and light receiving is installed in an electronic beam exposure device which is composed of an electron gun 1, an irradiation lens 2, an objective lens 4, a deflecting device 5, a CPU6, a stage 7 having a sample 3 on it and a stage driving means 8. A light from a light source 14 is irradiated onto the sample 3 through a tube 12 and a photo fiber 9 and then, the reflected light is detected in a photoelectric detector 15 via the photofiber 9 and a tube 13, and then, an electrostrictive element 11 is controlled to vary the relation between the fiber bundle and the sample so that the information may be stored in a CPU and the image forming position of the electronic beam may coincide with the sample surface. With this, even if the sample is moved on a horizontal plane, the electronic beam is not made obscure and high accurate exposure can be performed.
申请公布号 JPS5694742(A) 申请公布日期 1981.07.31
申请号 JP19790172800 申请日期 1979.12.28
申请人 NIPPON ELECTRON OPTICS LAB 发明人 KONNO SHIGEO
分类号 H01L21/027;H01J37/304 主分类号 H01L21/027
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