| 摘要 |
PURPOSE:To prevent a deflection accuracy from lowering because of a charged pulluted material sticked to an electrostatic deflecting device by a method wherein a metallic plate having fine holes through which full electronic beams deflected by an electrostatic deflecting device pass is arranged near the electrostatic deflecting device. CONSTITUTION:A variable rectangular electronic beam exposure device is composed of an electron gun 1, an aberration lens 2, rectangular slits 3, 6 an electronic lens 4, an image forming position controlling electrostatic deflecting device 4, a reduction lens 7, a beam open angle limitation throttle valve 8, an objective 9, a positioning electromagnetic polariscope 10, a positioning electrostatic polariscope 11, a glass substrate 12 on which an electronic ray photo sensing resist is applied, an XY stage 13, and a metallic plate provided with fine holes. The metallic plate 20 provided with fine holes is arranged near the electrostatic polariscope and the electronic beam reflected from the apparatus arranged at a lower part is prevented from reaching the deflecting device, thus, the deflection accuracy to the electrostatic deflecting device due to a charge accumulation is prevented from lowering. |
