发明名称 TREATMENT OF GRAPHITE CUBET
摘要 PURPOSE:To enhance the sensitivity of measurement, eliminate the memory effect by the previous sample and afford durability by allowing silicon or silicon compound to exist on the surface of a graphite cubet, and heat treating this cubet under specific conditions. CONSTITUTION:Silicon or silicon compound (sodium silicate, potassium silicate, polymethyl silicone oil, silica gel, white carbon, magnesium silicate, zirconium silicate, silicon tetrachloride) is allowed to exist on the surface of the sample receiving part of a graphite cubet, and this cubet is heat treated at 2,200-3,300 deg.C under an inert atmosphere. To allow silicon or silicon compound to exist on the surface of the graphite cubet, methods of allowing the same to exist only the surface of the cubet by brushing, immersing, scattering of fine particles, etc. are desirable. For the heat treatment temp., low temp. will require a long time of treatment and >=3,500 deg.C temperatures are inadequate because the cubet cracks.
申请公布号 JPS5694247(A) 申请公布日期 1981.07.30
申请号 JP19790170309 申请日期 1979.12.28
申请人 TOKUYAMA SODA KK 发明人 OONISHI KATSUTOSHI
分类号 C04B41/87;G01N21/31;G01N21/74 主分类号 C04B41/87
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