| 摘要 |
1. Method for depositing on glass substrate heated to a temperature of about 590 degrees C to 650 degrees C an adherent tin oxide coating having a resistivity of 5 x 10**-3 Ohm.cm or less, which comprises projecting on this substrate, under the form of laminar gas streams meeting in close proximity to a portion of said substrate's surface, a volatile tin compound and water vapor both diluted in separate own flows of carrier gas containing at least 30% of hydrogen (v/v) and which comprises displacing the substrate with regard to said streams so as to obtain said coating by formation of a homogeneous tin oxide deposit that takes place successively on progressively renewed and jointed areas of the substrate's surface. |
