| 摘要 |
PURPOSE:To prevent the positional deviation and the dimensional variation of electron beams by providing the first blanking deflector above the blanking aperture of the electron beam exposure device of a variable rectangular system and providing the second blanking deflector under the blanking aperture. CONSTITUTION:In the electron beam exposure device of a variable rectangular system consisting of the first aperture 4, a blanking aperture 7, a beam form controlling deflector 9, the second aperture 10, an objective aperture 11, a deflector 12, an objective electron lens 13 and a specimen face 14, the first blanking deflector 5 is provided between the first aperture 4 and the blanking aperture 7, and the second blanking deflector 8 is provided between the blanking aperture 7 and the second aperture 10. By providing this second blanking deflector 8, electron beams which passed the aperture 7 are deflected in the opposite direction so that the positional deviation of the elecron beams and the dimensional change of the beams may be prevented. |
