发明名称 APERTURE OF ELECTRON BEAM DEVICE
摘要 PURPOSE:To enable an axis alignment to be carried out without any peculiar use of a Faraday Cup, with provision of No.1 holder which supports aperture plates and includes retainer rings, and No.2 holder which supports No.1 holder via some insulator and includes another retainer ring. CONSTITUTION:Apertures 6, 8 and 11 of an electron beam exposure device is provided with No.1 holder 23 supported in No.2 holder 21 via insulator 22 on which aperture plate 24 and retainer ring 26 are installed. Further, retainer ring 25 is engaged with the open end of No.2 holder 21 via screw mechanism, while lead wire 27 is connected to No.1 holder 23. Therefore, apertures 6, 8 and 11 can be adjusted in sequential manner with an ammeter connected to lead wire 27, when beam axis alignment is required. Thus, axis alignment can be carried out easily and quickly without any peculiar use of a Faraday CPU.
申请公布号 JPS5691364(A) 申请公布日期 1981.07.24
申请号 JP19790167329 申请日期 1979.12.22
申请人 FUJITSU LTD 发明人 OKABE MASAHIRO;ITOU AKIO
分类号 H01J37/09;H01J37/244;H01J37/30;H01L21/027 主分类号 H01J37/09
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