发明名称 DEVICE FOR PROCESSING SEMICONDUCTOR SUBSTRATE
摘要 PURPOSE:To reduce the frequency of changing a substrate container by providing the first conveying menas and moving means on one side of conveying mechanisms having processing means to process semiconductor substrates and providing the second conveying means and moving means on the other side. CONSTITUTION:Plural first containers 1a are provided on the first conveying means 12a and semiconductor substrates 2 are transferred to the second containers 1b at the same time by the first moving means 21a. Next, a substrate supplying stage 4 is lowered by a feed screw 11a and substrates are conveyed one by one to the second conveying means consisting of a conveyer belt 8, and processing such as resist coating, etc., is applied to the substrates. On the opposite side of the second conveying means, a substrate receiving means with the third containers and the second moving means which transfers substrates at the same time to the fourth containers provided on the third conveying means are provided symmetrically to the above- mentioned construction. By so doing, the frequency of changing the containers is reduced and processing efficiency is improved.
申请公布号 JPS5691427(A) 申请公布日期 1981.07.24
申请号 JP19790170117 申请日期 1979.12.25
申请人 MITSUBISHI ELECTRIC CORP 发明人 YAMAZAKI MASATOSHI
分类号 H01L21/30;H01L21/027;H01L21/677 主分类号 H01L21/30
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