| 摘要 |
PURPOSE:To make it possible to form coating of high quality on the surface of a semiconductor element, by attaching net on the internal wall surface of a vacuum chamber excepting the part where a target is set so as to prevent the formation of microfine dust. CONSTITUTION:Nets 6 made of stainless steel etc. are attached by setting metal fittings 7 to the internal wall surface of a vacuum chamber 1 excepting the part corresponding to a target 5. The mesh of the net is about 0.1mm.-3cm in size. The net restrains the release of fine coating formed on the internal wall surface 1b of the vacuum chamber 1 during operation, or on the surface 4a opposite to the target holder 4, hereby the formation of microfine dust in the vacuum chamber 1 is prevented. Hence high-grade fine coating made of desired metal is formed on the surface of material to be treated e.g. semiconductor element 3. |
