发明名称 Semiconductor device with high-ohmic layer - which is between low-ohmic layer and FETs to give power supply needing no conducting paths
摘要 <p>The semiconductor device has a semiconductor element with a drain, source and gate together with a semi-isolating GaAs substrate. A low-ohmic layer (7) is connected to the supply voltage and separate from the semiconductor element (2-4) by a high-ohmic layer (5). Further low-ohmic and high-ohmic layers may be provided. The layers form a power supply for the semiconductor element that has no conducting paths (or at least very few). The low- ohmic layer may be metal or strongly doped and may have holes through which signal lines pass. The current path between low-ohmic layer (7) and drain (2) is very high-ohmic and therefore acts as a current source.</p>
申请公布号 DE3000924(A1) 申请公布日期 1981.07.16
申请号 DE19803000924 申请日期 1980.01.11
申请人 SIEMENS AG 发明人 KRAUSE,GERHARD
分类号 H01L23/528;H01L25/065;H01L27/02;(IPC1-7):01L27/04;01L29/76 主分类号 H01L23/528
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