| 摘要 |
PURPOSE:To manufacture emulsion masks of high grade in a high yield by removing antihalation films after exposure and before development. CONSTITUTION:A silver compound-base emulsion with high sensitivity is applied to the surface of a glass plate to form a highly photosensitive emulsion film, and an antihalation film is formed on the under surface of the plate. The emulsion film is exposed through a mother mask and dipped in an antihalation film removing soln. consisting of pure water, metol, sodium sulfite, hydroquinone and boric acid to remove the antihalation film, and then washing, development and fixing are carried out to obtain an emulsion mask. Thus, the degree of pollution in the develloping vessel can be reduced, and the emulsion mask has a fine emulsion film on the surface. |
