发明名称 Lock and elevator arrangement for loading workpieces into the work chamber of an electron beam lithography system
摘要 In apparatus having a work chamber in which workpieces are treated under high vacuum, that improvement comprising an inner chamber having a capacity for a plurality of workpieces, an outer chamber, vacuum means for evacuating the inner and outer chambers, a first valve for sealing between the work chamber and the inner chamber, a second valve for sealing between the inner and outer chambers, a third valve for sealing between the outer chamber and the atmosphere, loading means for loading workpieces through the third valve into the outer chamber from the atmosphere, and transfer means for transferring individual workpieces through the second valve between the inner and outer chambers, and for transferring individual workpieces through the first valve between the inner chamber and the work chamber.
申请公布号 US4278380(A) 申请公布日期 1981.07.14
申请号 US19790034504 申请日期 1979.04.30
申请人 VARIAN ASSOCIATES, INC. 发明人 GUARINO, NICHOLAS
分类号 H01J37/18;H01L21/00;H01L21/677;(IPC1-7):B65B21/02 主分类号 H01J37/18
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