| 摘要 |
PURPOSE:To detect with ease a photomask of a poorly imaged pattern by a method wherein a prescribed quantity of exposure is provided to a sensitive film by repeating a drawing twice. CONSTITUTION:If exposure regions of two continuous times are different from each other because of calculation errors in an electric circuit, black exposure regions 5 are produced outside or inside the pattern 4 on the resist layer 3. A resist thickness of the region 5 is of 1/2 thickness of an unsensitized part. In the next place, if the pattern is examined under a reflected light with a microscope, an abnormal region 5, unexposed layer 3 and transmitted light pattern 4 are different in color tone and identified clearly and accurately. Accordingly, the photomasks of poor quality are easily removed and a manufacturing yield of IC is improved. |
