发明名称 METHOD OF PATTERN FORMING OF MAGNETIC BUBBLE ELEMENT
摘要 PURPOSE:To effectively prevent a position discrepancy between positions of conductor pattern and permalloy pattern by protruding the upper part of a mark on the conductor pattern side by a method wherein a resist pattern for forming a position fitting mark on the conductor pattern side is left and attached with every layer by in sequence thereon. CONSTITUTION:A spacer layer 3 is formed on a magnetic film 2 of a substrate 1, a conductor layer 4' for forming a conductor pattern 4 is formed thereon and in addition, the resist pattern for forming the pattern 4 and a resist pattern 7m for forming the position fitting mark are formed on the layer 4'. Then, a planar layer 8 is attach-formed on the patterns 7 and 7m. At this time, the pattern 7 is formed in sharp and the pattern 7m is formed in such a manner as having an easy slope, and when the pattern 7 and an insulator 8m are lifted off to be removed, the pattern 7m and the insulator 8m are left behind. And further, an insulated layer 5, permalloy layer 6 and anti-halation film 9 and the like are formed in sequence and the top of the pattern 7 is protruded to prevent the position discrepancy between the positions of the pattern 4 and the permalloy pattern.
申请公布号 JPS5685812(A) 申请公布日期 1981.07.13
申请号 JP19790163799 申请日期 1979.12.17
申请人 FUJITSU LTD 发明人 FUJIWARA HIDEKI
分类号 G11C11/14;H01F41/14;H01F41/34 主分类号 G11C11/14
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