发明名称
摘要 <p>PURPOSE:To supply a proper amount of O2 at all time to a utilizing apparatus of oxygen, by detecting the oxygen flow rate supplied to the utilizing apparatus of oxygen and the oxygen concentration expelled from the apparatus, and adjusting the supplying pressure of the mixed gas of N2 and O2 based on the detected values. CONSTITUTION:A mixed gas consisting of N2 and O2 essentially is supplied from a supply pressure pump 4, a water drop separator 5 to an adsorbing column 1 or 2 containing an absorbent for N2, and the resultant gas containing concentrated O2 is stored in an oxygen tank 12. The concentrated oxygen in the tank 12 is supplied from an electromagnetic flowmeter 14 for the oxygen flow rate supplied and a supply port 15 to a utilizing apparatus 16, e.g. a cultivating tank, and expelled from a vent hole 17. The oxygen flow rate detected by the flowmeter 14 and the oxygen concentration detected by a sensor 19 provided at the vent hole 17 are sent to a controller 24, and control signals of the supply pressure of the mixed gas corresponding to the supply oxygen flow rate under the given necessary oxygen concentration based on the detected values are output to the pump 4 to control the supply pressure of the mixed gas.</p>
申请公布号 JPS647001(B2) 申请公布日期 1989.02.07
申请号 JP19800027956 申请日期 1980.03.07
申请人 HITACHI LTD 发明人 TOMOMURA MASAOMI;YOKOYAMA HIROSHI;YAHAGI TOSHIO;NOKITA SHUNSUKE;OTAHARA YOJI
分类号 C01B13/02;B01D53/04;C10L1/32;C12M1/04 主分类号 C01B13/02
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