| 摘要 |
PURPOSE:To manufacture a thin multicomponent system film free from dislocation of composition ratio, by using a composite target in which thin film-forming materials are vapor-deposited on a plate in an area ratio so that the required composition ratio is reached. CONSTITUTION:Cu, etc., are used for a plate to be a target. Y1, Ba2, Cu3 etc., as thin film-forming elements, are vapor-deposited onto this Cu substrate 10 by a PVD method into sectorial or other patterns, by which a composite target is prepared. At this time, vapor deposition is carried out in an area ratio in which respective metals as component materials are formed into a composition ratio capable of showing the desired superconducting phenomenon when formed into a thin film. By using this composite target, the thin multicomponent system superconducting film of Y-Ba-Cu-O or other types can be manufactured by means of sputtering. |
