| 摘要 |
The appliance consists of a chamber (10) which is fitted in an electrically insulated manner with a cathode support (22) for a cathode (20) with a cathode material layer (24) to be sputtered. An anode (26) is fashioned so as to retain a substrate (28) to be coated. The surfaces (30, 32) of the cathode material layer (24) and of the substrate (28) are parallel to one another and are arranged so as to be tilted with respect to a horizontal plane. The appliance is operated with an inert atmosphere having a pressure of 6.5-1.3.10<-3> mbar and a voltage of 800 V. When the substrate is coated by cathode sputtering, a uniform film is formed thereon, and the cathode material layer (24) can be used up virtually completely, without pieces dropping down owing to fracturing and thus being lost to the operation. <IMAGE>
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