发明名称 Jig for rotating substrate holders in vapour deposition plants - where each holder is rotated through an arc via spring:loaded lever
摘要 <p>In the plant is a rotating turntable fitted on its top rim with a circular row of horizontal pivot shafts (4). Each shaft (4) carries a roller (11) to which a substrate holder is fixed; and roller (11) can be rotated through an arc of e.g. 180 deg. by the curved end of a lever (5) mounted on a horizontal pivot shaft (6). A circular row of shafts (6), each carrying a lever (5), is located round the turntable. At the bottom end of each lever (5) is a pivot shaft (15) carrying an adjustable lever (14). When the lower end of lever (14) meets a limit stop (21) due to the rotation of the turntable, lever (5) moves through an arc, thus rotating roller (11) and the substrate holder. Both sides of a substrate can be exposed to the vapour, or two substrates can be mounted back to back for increased output when only one side of each substrate is to be coated.</p>
申请公布号 DE2951465(A1) 申请公布日期 1981.07.02
申请号 DE19792951465 申请日期 1979.12.20
申请人 SIEMENS AG 发明人 BIBERACHER,LUDWIG
分类号 C23C14/50;(IPC1-7):23C13/08;23C13/00 主分类号 C23C14/50
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