摘要 |
<p>In the plant is a rotating turntable fitted on its top rim with a circular row of horizontal pivot shafts (4). Each shaft (4) carries a roller (11) to which a substrate holder is fixed; and roller (11) can be rotated through an arc of e.g. 180 deg. by the curved end of a lever (5) mounted on a horizontal pivot shaft (6). A circular row of shafts (6), each carrying a lever (5), is located round the turntable. At the bottom end of each lever (5) is a pivot shaft (15) carrying an adjustable lever (14). When the lower end of lever (14) meets a limit stop (21) due to the rotation of the turntable, lever (5) moves through an arc, thus rotating roller (11) and the substrate holder. Both sides of a substrate can be exposed to the vapour, or two substrates can be mounted back to back for increased output when only one side of each substrate is to be coated.</p> |