| 摘要 |
<p>PURPOSE:To facilitate the checking of a defect pattern caused by dusts by a method wherein a photo-sensitive organic film is formed on a semiconductor substrate and a desired pattern is transfer-copied on the film and thereby a double-exposure image having a periodical lapse is formed at the circumferential part of the substrate seperate from the original pattern. CONSTITUTION:When a desired pattern is transfer-copied on a photo-sensitive organic film coated on the semiconductor substrate, unworked part is selected at a flat circumferential part of the same substrate and a separate positive photo-resist layer of a photo-sensitive organic film is coated on the unworked part. Then, a clean reticle is applied to transfer-copy the pattern 102 and exposed for about half a nomal exposure time and thereafter developed. A plurality of substrate are prepared and after the elapse of several hours or several days, it is overlapped on one pattern 102, the second exposure under a half of the normal exposure time is applied to get the pattern 103, but if there is any part 104 having poor exposure lower than that of a normal pattern, it is judged that some dusts exist on the reticle as compared with the remaining substrate.</p> |
