| 摘要 |
PURPOSE:To form a fine aperture into a taper shape and improve characteristics, such as high resolution by etch-processing the fine aperture plate from one side. CONSTITUTION:Photoresist is coated on the material 1 of a fine aperture plate, baked, and developed. By forming the pattern of the fine aperture and then the fine aperture from one side, the fine aperture plate 4 is obtained. This process can the fine aperture with required hole dimensions, small diameter, and the taper shape. |
