发明名称 PRODUCTION LOT NUMBER EXPOSURE DEVICE
摘要 PURPOSE:To realize miniaturization and to enable incorporation into another exposure device by changing one part of optical system by providing a scanning mirror which allows the exposure position for a pair of objects to be exposed to be changed, and then by facilitating exposure of lot numbers in stage fixation. CONSTITUTION:A scanning mirror 17 for changing optical path is provided after a reduction lens 16 and then a rotary part 20 is provided to change incident angle of light into an object to be exposed in reference to the light axis L of optical system of lens in a specified angle each time. Then, the scanning width is made smaller and larger where the exposure position is closer to or away from the center of light axis, respectively. Thus, a lot number 21 is formed at an unexposed area (area of metal film 22) on mask exposure. It allows the unit to be compact, cost effective, and to be incorporated into another exposure device since the object to be exposed is fixed.
申请公布号 JPS6442812(A) 申请公布日期 1989.02.15
申请号 JP19870200407 申请日期 1987.08.11
申请人 NEC CORP 发明人 YOSHIHARA KOICHI
分类号 H01L21/02;H01L21/027;H01L21/30;H01L21/68 主分类号 H01L21/02
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