| 发明名称 |
Photoresist image hardening process. |
| 摘要 |
<p>Resist images are hardened so that they are flow resistant at elevated temperatures by coating the image with a porous film of a metal or insulator. The film is evaporated onto the resist image at a pressure of between about 10<Sup>-2</Sup> and 1 torrto a thickness of from about 200 A to about 1000A.</p> |
| 申请公布号 |
EP0030604(A2) |
申请公布日期 |
1981.06.24 |
| 申请号 |
EP19800106482 |
申请日期 |
1980.10.23 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CANAVELLO, BENJAMIN JOHN;HATZAKIS, MICHAEL |
| 分类号 |
H01L21/027;G03F7/40;(IPC1-7):03F7/26 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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