| 摘要 |
A method of making a thin-film magnetic head having a multi-turn structure includes forming a lower magnetic layer on a substrate, and successively forming a first insulating layer and a first conductive layer over the lower magnetic layer. Then, a first coil patterned mask is formed on the first conductive layer, and an ion beam is applied onto a structure formed by the foregoing steps. The ion beam simultaneously etches the first insulating layer and first conductive layer so that a first coil patterned double-layer is formed. Then, a second insulating layer is formed followed by an upper magnetic layer, over the first coil patterned double-layer. Thus, a magnetic gap is formed between the lower and upper magnetic layers defined by the thickness of the second insulating layer.
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