Photographic photosensitive materials

摘要

A photographic photosensitive material which is characterized by at least one surface layer of the photographic photosensitive material containing an organic carboxylic acid amide of the following formula (I) having one or more unsaturated bonds: (I) wherein R1 represents a hydrocarbon group having 18 to 23 carbon atoms and at least one double bond and each of R2 and R3 represents a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms is disclosed.