| 摘要 |
There is provided a process for removing pollutant particulates from a contaminated gas which comprises: (a) passing a stream of gas containing pollutant particulates through a liquid film absorbed on a continuously circulating filter supported by a perforated carrier matrix wherein part of said filter is continuously passing through a liquid reservoir containing said filtering liquid selected from liquid fluorocarbons and liquid silicones whereby the contaminant particulates carried by said gas are absorbed by said liquid film acting as a filter barrier for said particulates, and (b) recovering the gas after its passage through said liquid film barrier filter, said gas being free of said particulates. There is also disclosed an apparatus for carrying out the process. The apparatus can be positioned in a face mask.
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