发明名称 |
Method and means for measuring moisture content of hermetic semiconductor devices |
摘要 |
The moisture content of a hermetically sealed semiconductor device is a function of the dew point of the cavity atmosphere which is the temperature of maximum surface conductivity. A pattern of interdigitated thin film aluminum conductors is provided on an impurity free, non-porous silicon oxide insulative substrate. The surface conductivity of this structure rises as moisture condenses onto and between the conductors as the temperature is reduced at a slow controlled rate to the dew point temperature. The amplitude of the maximum surface conductivity is proportional to ionic impurity concentration. |
申请公布号 |
US4272986(A) |
申请公布日期 |
1981.06.16 |
申请号 |
US19790030498 |
申请日期 |
1979.04.16 |
申请人 |
HARRIS CORPORATION |
发明人 |
LOWRY, ROBERT K.;MILLER, LARRY A. |
分类号 |
G01N25/68;G01N27/04;(IPC1-7):01N27/18 |
主分类号 |
G01N25/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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