Rinse melt for LPE crystals

摘要

A rinse process for solvating adhered primary melt residue from magnetic garnet crystals grown via liquid phase epitaxial (LPE) techniques. The rinse melt consists of a mixture having a saturation to nucleation temperature range that encompasses the primary melt's growth temperature and a solvent compound different from that used in the primary melt, which will solvate the solvent used in the primary melt and will not produce undesirable rinse melt adhesion.